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| Customization: | Available |
|---|---|
| After-sales Service: | Yes |
| Warranty: | One Year |
Dual-Head Magnetron Plasma Sputtering system / Magnetron Sputter Coater
The VTC-600-2HD is a compact magnetron sputtering system featuring dual 2" target sources: one DC source for coating metallic films and one RF source for non-metallic materials. It includes a film thickness tracker for precise process control. This system is designed for low-cost, high-efficiency coating of single or multiple layers across materials such as alloys, ferroelectrics, semiconductors, ceramics, dielectrics, optical films, and PTFE.
| Input Power | 220VAC 50/60Hz, single phase; 2000W (including pump) |
| Source Power | Two integrated power sources: DC (500W) for metals; RF (600W) with auto-matching for non-metals. |
| Sputtering Head | Two 2" Magnetron Sputtering Heads with water cooling jackets; Target size 2" diameter; Thickness range 0.1 - 5 mm. |
| Vacuum Chamber | Stainless steel, 300 mm Dia x 300 mm height; 100 mm observation window; Hinged cover with air spring. |
| Sample Holder | 140mm dia. (max 4" wafer); Rotation 1 - 20 rpm; Heating up to 500°C Max with +/- 1.0 °C accuracy. |
| Gas Control | Two precision digital MFCs (Mass Flow Controllers); Flow rate up to 200 ml/min, adjustable via touch screen. |
| Vacuum Station | High-speed German-made turbo vacuum pump system with heavy-duty mechanical pump; Max vacuum level: 10^-6 torr. |
| Thickness Monitor | Precision quartz thickness sensor; accuracy 0.10 Å; Real-time display of thickness and coating speed. |
| Net Weight | 160 kg |
| Dimensions | L1300mm × W660mm × H1200mm |






Professional research and development focusing on scientific equipment including tube furnaces, muffle furnaces, plasma cleaners, and CVD systems.


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