DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering System with Thickness Monitor

Customization: Available
After-sales Service: Yes
Warranty: One Year

Product Description

📑 Basic Specifications
Model NO.
CY-VTC-600-2HD
Structure
Desktop
Material
Stainless Steel
Certification
CE, TUV
Application
Lab
DC Source
500W
RF Source
600W
Vacuum Chamber
Stainless Steel
Package Size
120.00cm * 120.00cm * 170.00cm
Gross Weight
300.000kg
🔍 Product Overview

Dual-Head Magnetron Plasma Sputtering system / Magnetron Sputter Coater

The VTC-600-2HD is a compact magnetron sputtering system featuring dual 2" target sources: one DC source for coating metallic films and one RF source for non-metallic materials. It includes a film thickness tracker for precise process control. This system is designed for low-cost, high-efficiency coating of single or multiple layers across materials such as alloys, ferroelectrics, semiconductors, ceramics, dielectrics, optical films, and PTFE.

🛠️ Technical Parameters
Input Power220VAC 50/60Hz, single phase; 2000W (including pump)
Source PowerTwo integrated power sources: DC (500W) for metals; RF (600W) with auto-matching for non-metals.
Sputtering HeadTwo 2" Magnetron Sputtering Heads with water cooling jackets; Target size 2" diameter; Thickness range 0.1 - 5 mm.
Vacuum ChamberStainless steel, 300 mm Dia x 300 mm height; 100 mm observation window; Hinged cover with air spring.
Sample Holder140mm dia. (max 4" wafer); Rotation 1 - 20 rpm; Heating up to 500°C Max with +/- 1.0 °C accuracy.
Gas ControlTwo precision digital MFCs (Mass Flow Controllers); Flow rate up to 200 ml/min, adjustable via touch screen.
Vacuum StationHigh-speed German-made turbo vacuum pump system with heavy-duty mechanical pump; Max vacuum level: 10^-6 torr.
Thickness MonitorPrecision quartz thickness sensor; accuracy 0.10 Å; Real-time display of thickness and coating speed.
Net Weight160 kg
DimensionsL1300mm × W660mm × H1200mm
📸 Product Display
📦 Packaging & Service
Package Details
Factory-direct pricing with premium quality.
One-year free maintenance for equipment.
Customized service for specialized research demands.
Fast and flexible delivery options (Sea, Air, Express).
Professional response within 24 hours.
🏭 Manufacturing & Exhibition

Professional research and development focusing on scientific equipment including tube furnaces, muffle furnaces, plasma cleaners, and CVD systems.

❓ Frequently Asked Questions
Q: What types of materials can this sputtering system coat? A: It can coat both metallic films (using the DC source) and non-metallic materials like ceramics, semiconductors, and dielectrics (using the RF source).
Q: What is the maximum sample size for the holder? A: The standard sample holder is 140mm in diameter, suitable for wafers up to 4 inches.
Q: How accurate is the film thickness monitoring? A: The built-in precision quartz thickness sensor provides an accuracy of 0.10 Å.
Q: Can the sample be heated during the coating process? A: Yes, the sample holder temperature is adjustable from room temperature to a maximum of 500°C.
Q: What kind of vacuum level can the system achieve? A: With the high-speed turbo pump system and chamber baking, it can reach a vacuum level of 10^-6 torr.
Q: Is a cooling system included? A: Yes, a digitally controlled recirculating water chiller is included to cool both magnetron sputtering heads.

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